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Non-Photodefinable Polyimide SEMICOFINE™
Technological Elements

- SEMICOFINE™ is a polyimide coating material developed through a concentration of unique design technologies for polyimide heat-resistant resin. There are diverse products to meet every need, and these have been used for many years as protective films, insulation films, etc. for semiconductors/electronic components.
Features
1. High reliability (heat resistance, mechanical properties, insulation properties, chemical resistance)
2. Heat resistance of 500°C or above
3. A varied product lineup to match the application and process (Low CTE products, thin film/thick film process compatible products)
Applications/Usage
<Usage Method>

<Application Examples>
• Semiconductor Surface Protection Film (Buffer Coating)
• Wafer/Panel Level Package Redistribution Layer (RDL)
• Electronic Component Interlayer Insulation Film, Hollow Structure Formation Applications
Semiconductor Buffer Coating

Electronic Components

Redistribution Layer (RDL)

Technology Information
<Product Characteristics>
| SP Series | |
|---|---|
| Cure Temperature [°C] | 320 to 350 |
| Tensile Strength [MPa] | ≥ 180 |
| Elongation [%] | ≥ 20 |
| Elastic Modulus [GPa] | 2.9 to 4.4 |
| CTE [ppm/°C] | 1 to 40 |
| Glass Transition Temperature [°C] | ≥ 283 |
| 5% Weight Reduction Temperature [°C] | ≥ 545 |
Related Products
Related Information
-
- 2026
- 04.09
Press Release
High Thermal Resistant, and Low-Residual Stress Photo-definable Polyimide Sealing Material
-
- 2025
- 11.27
Press Release
Toray Develops Temporary Bonding Material for Uniformly Ultra-Thin Semiconductor Wafers
-
- 2024
- 10.23
Press Release
Toray Jointly Develops High-Speed Mounting Technology to Expand Silicon Photonics
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