Coating Material Photodefinable Polyimide PHOTONEECE™
PHOTONEECE™ is a liquid type photodefinable polyimide designed to accommodate various mechanical properties required by the makers of various semiconductor and electronic component makers around the globe. Product line-up consist of PW-Series (High temp. curable positive photodefinable), UR-Series (High temp. curable negative photodefinable), LT-Series (Low temp. curable positive photodefinable) and PN-Series (Low temp. curable negative photodefinable). These products are utilized for passivation and dielectric layers necessary for devices and components.
Features
- High reliability (high heat resistance, mechanical properties, dielectric constant and chemical resistance)
- Excellent photo sensitivity and patterning dimensional control
- Variety of product line-ups for maximum process versatility
Applications/Usage
- Buffer coating / Passivation for IC Chips
- Dielectric layers for RDL (WLP and PLP)
- Dielectric layers and cavity / MEMS formation for electronic components.
PHOTONEECE Process Example
Application Examples
Standard Products
◆Basic Properties
| GN Series | LT Series | PW Series | |
|---|---|---|---|
| Features | Thick film applicable, High thermal resistance |
Low temperature curable, High resolution |
High sensitivity, High resolution |
| Type | Negative tone | Positive tone | Positive tone |
| Developer | Alkali | Alkali | Alkali |
| Cure temperature(℃) | ≧300 | ≧200 | ≧300 |
| Film thickness(μm) | 8~20 | 1~11 | 1~11 |
| Resolution(μm) | ≧30 | ≧5 | ≧5 |
◆Material Property Data
| GN Series | LT Series | PW Series | |
|---|---|---|---|
| Tensile strength(MPa) | ≧150 | ≧130 | ≧150 |
| Elongation(%) | ≧40 | ≧50 | ≧50 |
| Modulus(GPa) | ≧3 | ≧2 | ≧3 |
| CTE(ppm/℃) | ≦50 | ≦50 | ≦40 |
| Glass transition temperature(℃) | ≧300 | ≧270 | ≧300 |
| 5% weight reduction temperature(℃) | ≧500 | ≧350 | ≧450 |
Fluorine-free Products
◆ Basic Properties
| GN-K Series | LT-K Series | PW-K Series | |
|---|---|---|---|
| Features | Low temperature curable, Thick film applicable |
Low temperature curable, High resolution |
High sensitivity, High resolution |
| Fluorine free, NMP free | 〇 | 〇 | 〇 |
| Type | Negative tone | Positive tone | Positive tone |
| Developer | Alkali | Alkali | Alkali |
| Cure temperature(℃) | ≧200 | ≧200 | ≧300 |